Polishing of polycrystalline diamond using synergies between chemical and mechanical inputs: A review of mechanisms and processes

Polycrystalline diamond (PCD) deposited as a thin film is an attractive material, both technologically and from scientific viewpoint, due to its unique combination of properties. However, because many applications require the PCD have high quality surface finish, efficient cost-effective polishing has become critical limiting step in advancing more widespread use PCD. The most widely-used processes for make synergies that can be achieved through applying chemical mechanical inputs. This paper reviews current state-of-the-art such processes, which are mainly represented by (CMP) technology, An in-depth informative literature survey presented effects characteristics process-dependent factors slurry composition, pad/plate parameters, on polishing/material removal rate quality. Particular attention given underlying mechanisms governing material during polishing, complex vary depending process, still unclear. Three main routes identified summarized based experimental results, characterizations computational simulations: interfacial mechanochemical removal, chemically-stimulated transformation diamond. Finally, recently developed methods ultraviolet plasma irradiations introduced, limitations existing research future directions discussed.